Gigaphoton Launches hTGM New Neon Recovery System, Claiming a Recovery Rate of 50%
Ai Focus
According to reports from Tom's Hardware, Japanese semiconductor lithography equipment manufacturer Gigaphoton has launched a new neon gas recovery system hTGM for argon fluoride (ArF) excimer lasers. The company claims that this system can achieve a 50% neon gas recovery rate, and there is hope to further improve it in the future with adjustments to the configuration.
October 6th news from BJW_KEEP_00001_ Home: According to a report today from tech media BJW_KEEP_00002_'s BJW_KEEP_00003_, Japanese semiconductor lithography equipment manufacturer BJW_KEEP_00004_ has launched a new neon gas recovery system BJW_KEEP_00005_ for argon fluoride (argon fluoride) excimer lasers.
It is reported that this system can achieve a neon recovery rate of 50%, and with future adjustments to the system configuration, it is expected to further improve the recovery efficiency. This technology has the potential to fill the gap in the semiconductor supply chain after the Russia-Ukraine conflict. Before 2022, Ukraine supplied approximately 50% of the world's neon gas, but was subsequently forced to stop exports.
At the same time, approximately 70% of the global neon production is used in semiconductor manufacturing, with a large portion of that being applied in advanced deep ultraviolet (Note from IT: DUV) lithography processes. Following this, regions such as China and South Korea have increased their neon production efforts, and many chip manufacturers have also introduced neon recovery systems into their wafer manufacturing processes.
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